New Fab Line for Intel
Intel just announced the construction of a new Chip Fabrication Line to be built in Israel.
From
Ars Technica:
Intel announces Fab 28 in Israel
In a press conference held Thursday in Tel-Aviv, Israel, Intel officially announced the establishment of Fab 28. The new chip manufacturing plant will be located near Kiryat Gat, adjacent to Fab 18, and will utilize a 45nm process for producing chips on 300mm silicon wafers.
Intel has reportedly invested $4.42 billion in the new fab--the largest investment of its kind both for Intel and for Israel. Fab 28 will employ 4,400 new workers (including some 2,000 contracted positions), in addition to the 5,500 Israeli workers Intel already employs in the region.
The new fab will be the second 45nm plant after the Arizona based Fab 32, announced July 2005. Intel will use the "Copy Exact" methodology to make it an exact clone of its Portland, Oregon based fab. General Manager of Israel Operations, VP Alex Kornhauser, said Fab 28 is scheduled to be fully operational 3 to 6 months after Fab 32 - around mid 2008.
45 nanometer! I remember when 70 was state of the art a few years ago. Wonder what they are using to expose the chips -- x-rays?
Posted by DaveH at December 4, 2005 3:07 PM